Method of manufacturing a through-hole electrode substrate

ABSTRACT

A method of manufacturing a through-hole electrode substrate includes forming a plurality of through-holes in a substrate, forming a plurality of through-hole electrodes by filling a conductive material into the plurality of through-holes, forming a first insulation layer on one surface of the substrate, forming a plurality of first openings which expose the plurality of through-hole electrodes corresponding to each of the plurality of through-hole electrodes, on the first insulation layer and correcting a position of the plurality of first openings using the relationship between a misalignment amount of a measured distance value of an open position of a leaning through-hole among the plurality of through-holes and of a design distance value of the open position of the leaning through-hole among the plurality of through-holes with respect to a center position of the substrate.

CROSS REFERENCE TO RELATED APPLICATION

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2009-208374, filed on 7 Sep.2009, and No. 2010-175286, filed on 4 Aug. 2010, the entire contents ofwhich are incorporated herein by reference.

The present invention is related to a through-hole electrode substratearranged with a through-hole electrode which passes through the frontand back surfaces of a semiconductor substrate, and is also related to amethod of manufacturing the through-hole electrode substrate.

BACKGROUND OF THE INVENTION

1. Field of the Invention

With the progress in high integration and miniaturization of electronicdevices in recent years, LSI chips are being reduced to the same size asa semiconductor package while the high integration of chips arranged intwo dimensions within a package is reaching its limits. Therefore, it isnecessary to divide the LSI chips and stack them in three dimensions inorder to increase the mounting density of chips within a package. Inaddition, it is also necessary to reduce the distance between stackedcircuits in order to operate the entire semiconductor package stackedwith LSI chips at high speeds.

Thus, in response to the above stated demands, a through-hole electrodesubstrate arranged with a connection part which passes through the frontand back surfaces of the substrate is proposed as an interposer betweenLSI chips. In this type of through-hole electrode substrate, thethrough-hole electrode is formed by filling a conductive material (Cuetc) into a through-hole using electrolytic plating.

An example of a through-hole electrode substrate 10 is shown in FIG. 22.The through-hole electrode substrate 10 is arranged with a siliconsubstrate 11, a through-hole 12 which passes through the substrate inthe thickness direction of the silicon substrate 11, a through-holeelectrode 14 comprised from copper (Cu), nickel (Ni), gold (Au),multi-layer plating (Cu/Ni/Au) etc formed within the through-hole 12,and a land 15 comprised of copper (Cu), gold (Au), multi-layer plating(Cu/Ni/Au) etc arranged on the upper and lower surfaces of thethrough-hole electrode 14. Furthermore, although not shown in FIG. 22 aninsulation film comprised of silicon oxide SiO₂ etc is formed on theupper and lower surface from an inner wall of the through-hole 12.

The through-hole electrode substrate 10 shown in FIG. 22 is manufacturedby the method described below. First, a hole which does not passcompletely through the substrate is formed using a method such as RIE(Reactive Ion Etching), DeepRIE, light etching or wet etching on onesurface of the silicon substrate 11. Next, the silicon substrate 11 isthinned by a method such as grinding etc from the other surface of thesilicon substrate 11, that is, from the surface which is opposite to thesurface in which the hole is formed, and the hole passes completelythrough the substrate. An insulation film (not shown in the diagram) isformed on the inner surface of this through-hole 12 and on both surfacesof the silicon substrate 11 using a method such as thermal oxidation orCVD (Chemical Vapor Deposition). Next, after burying a conductivematerial comprised of a metal material such as Cu etc which becomes thethrough-hole electrode 14 within the through-hole 12 which is formedwith the insulation film, excess conductive material which sticks outfrom the through-hole 12 is removed using a method such as CMP (ChemicalMechanical Polishing). Following this, a land 15 is formed by patterningand which becomes the wiring and electrode pad made of copper (Cu) etcon the upper and lower surfaces of the silicon substrate 11.

However, in the through-hole electrode substrate 10 manufactured by themanufacturing method described above it is confirmed that a blow offphenomenon occurs in a wiring layer 15 or raised parts or cracks areproduced within the through-hole 12 during an anneal process.

For example, Japanese Laid Open Patent 2002-26520 and Japanese Laid OpenPatent 2000-252599 are proposed in order to reduce the blow offphenomenon which occurs in a wiring layer or raised parts or cracksproduced in an insulation film during an anneal process of themanufacturing process of the above described through-hole electrodesubstrate. In a multi-layer wiring substrate described in Japanese LaidOpen Patent 2002-26520, an opening is arranged so as to pass through thetop and bottom of a via island arranged directly above a via holeconductor filled with a conduction paste and an expansion of a gascomponent or water component included within the conduction paste issuppressed during thermal process. In the print substrate described inJapanese Laid Open Patent 2000-252599, a hole is arranged which isconnected with the external atmosphere and the conductive film whichcovers the surface of a sealing component of a resin which is filledinto a through-hole, and the gas which is discharged from the a sealingcomponent is released to the external atmosphere by adding heat duringreflow.

2. Description of the Related Art

However, the multi-layer wiring substrate and the print substrateproposed in the Japanese Laid Open Patent 2002-26520 and Japanese LaidOpen Patent 2000-252599 described above deal with defects produced bygas discharged from a through hold electrode filled in which thethrough-hole is filled with a conductive paste or resin, but do not dealwith defects produced by gas discharged from a through-hole electrode inwhich a through-hole formed with an insulation film is filled with ametal material as stated above.

A metal material such as copper (Cu) etc which is filled into thethrough-hole 12 as the through-hole electrode 14 stretches, gas (watercomponent (H₂O) or hydrogen (H₂) etc) which still remains in the metalmaterial is discharged during the anneal process, land 15 is raised upand the occurrence of the blow off phenomenon was confirmed. Inaddition, in the anneal process, when the heating temperature is raisedabove, for example, 400° C., raised parts and cracks are produced in aninsulation film due to the difference in a thermal expansion coefficientbetween a metal material such as Cu etc which is filled as thethrough-hole electrode 14 and an insulation material such as SiO₂ etcused as the insulation film, and if a metal material enters into thecracks there is a possibility that shorts will occur betweenthrough-hole electrodes. The through-hole electrode substrate 10 showsthat it is necessary to set the heating temperature during the annealprocess low in order to prevent this phenomenon. However, the annealprocess is necessary and measures are required because the discharge ofgas from the above described through-hole electrode 14 occurs even inthe case where a heating temperature does not cause cracks.

In addition, in the manufacturing process of the through-hole electrodesubstrate, tilt is produced in a part of the through-hole, amisalignment is produced between the position of an opening formed in aninsulation film which is formed on the upper and lower surfaces of a thesilicon substrate and the formation position of the through-hole, anddefects such as [step out] or [disconnection] of the rand describedabove are produced by the amount of misalignment of the opening withrespect to the lower surface of the through-hole in which tilt isproduced. Measures are necessary for dealing with defects that areproduced by tilt of this through-hole.

BRIEF SUMMARY OF THE INVENTION

A through-hole electrode substrate related to one embodiment of thepresent invention includes a substrate including a plurality ofthrough-holes, a plurality of through-hole electrodes arranged withineach of the plurality of through-holes, and a first insulation layerarranged on one surface of the substrate, wherein the first insulationlayer includes a plurality of first openings which expose each of theplurality of through-hole electrodes, the plurality of through-holesincludes a leaning through-hole leaning from one surface to the othersurface of the substrate, and each of the plurality of first openings isarranged to match an open position of the leaning through-hole.

A method of manufacturing a through-hole electrode substrate related toone embodiment of the present invention includes forming a plurality ofthrough-holes in a substrate, forming a plurality of through-holeelectrodes by filling a conductive material into the plurality ofthrough-holes, forming a first insulation layer on one surface of thesubstrate, forming a plurality of first openings which expose theplurality of through-hole electrodes corresponding to each of theplurality of through-hole electrodes, on the first insulation layer, andcorrecting a position of the plurality of first openings using therelationship between a misalignment amount of an open position of aleaning through-hole among the plurality of through-holes and a centerposition of the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a planar view diagram which shows a structure of athrough-hole electrode substrate related to a first embodiment of thepresent invention;

FIG. 2 is a cross sectional diagram which shows a structure of thethrough-hole electrode substrate in FIG. 1 see from the line A-A;

FIG. 3A is a diagram which shows a process for forming a through-hole;

FIG. 3B is a diagram which shows a process for forming an insulationfilm;

FIG. 3C is a diagram which shows a process for forming a seed layer;

FIG. 3D is a diagram which shows a process for forming a conductionpart;

FIG. 3E is a cross sectional diagram which shows a completedthrough-hole electrode substrate;

FIG. 4A is a diagram which shows a process for forming a resin layer;

FIG. 4B is a diagram which shows a process for forming a seed layer anda plate resist;

FIG. 4C is a cross sectional diagram which shows a completedthrough-hole electrode substrate;

FIG. 5 is a diagram which shows a cross section a through-hole electrodesubstrate with a titled through-hole;

FIG. 6A is a SEM photograph of the region A shown in FIG. 5;

FIG. 6 (B) is a SEM photograph of the region B shown in FIG. 5;

FIG. 7 is a cross sectional diagram of the through-hole electrodesubstrate formed with a resin layer related to the first embodiment;

FIG. 8A is a diagram which shows a [step out] of an opening in theregion A shown in FIG. 7;

FIG. 8B is a diagram which shows a [disconnection] of an opening in theregion B shown in FIG. 7;

FIG. 9 is a diagram which shows an example whereby a plurality ofconventional chip shaped through-hole electrode substrate are formedwithin a wafer;

FIG. 10 is a diagram which shows a cross section of a through-holeelectrode substrate in which the position of an opening formed in aresin layer is corrected with respect to a tilted through-hole;

FIG. 11A is a diagram which shows a conventional mask A in which theposition of an opening formed in a resin layer is not corrected;

FIG. 11B is a diagram which shows a mask B of the present invention inwhich the position of an opening formed in a resin layer is corrected;

FIG. 12 is a diagram which shows a cross section of a through-holeelectrode substrate manufactured using the mask B show in FIG. 11 (B);

FIG. 13A is a SEM photograph of a region A shown in FIG. 12;

FIG. 13B is a SEM photograph of a region B shown in FIG. 12;

FIG. 14 is a diagram which shows a gas discharge of a resin layer of thethrough-hole electrode substrate related to the first embodiment;

FIG. 15 is a diagram which shows an example wherein a plurality of chipshaped though hole electrode substrate are formed in a wafer related tothe first embodiment;

FIG. 16 is a planar view diagram which shows a structure of athrough-hole electrode substrate related to a second embodiment;

FIG. 17 is a cross sectional diagram which shows a structure of thethrough-hole electrode substrate shows in FIG. 16 seen from the lineB-B;

FIG. 18A is a diagram which shows a process for forming a through-holerelated to the second embodiment;

FIG. 18B is a diagram which shows a process for forming a resin layerrelated to the second embodiment;

FIG. 18C is a diagram which shows a process for forming a seed layerrelated to the second embodiment;

FIG. 18D is a diagram which shows a process for forming a conductingpart related to the second embodiment;

FIG. 18E is a cross section diagram of a completed through-holeelectrode related to the second embodiment;

FIG. 19A is a diagram which shows a process for forming a seed layerrelated to the second embodiment;

FIG. 19B is a diagram which shows a process for a plate resist relatedto the second embodiment;

FIG. 19C is a cross sectional diagram of a completed through-holeelectrode substrate related to the second embodiment;

FIG. 20 is a diagram which shows a gas discharge of a resin layer of thethrough-hole electrode substrate related to the second embodiment;

FIG. 21 is a diagram which shows a structure of an electronic circuitboard applied with a through-hole electrode substrate related to a thirdembodiment;

FIG. 22 is a cross sectional diagram which shows an example of aconventional through-hole electrode substrate;

FIG. 23 is a cross sectional diagram of a through-hole electrodesubstrate in which the shape of the through-hole is transformed relatedto a fourth embodiment is transformed;

FIG. 24 is a diagram which shows [step out] of an opening in a region Aand a region B shown in FIG. 23;

FIG. 25 is a cross sectional diagram of the through-hole electrodesubstrate formed with a resin layer related to the fourth embodiment;

FIG. 26A is a diagram which shows a conventional mask A in which theposition of an opening formed in a resin layer is not corrected;

FIG. 26B is a diagram which shows a proposed mask B in which theposition of an opening formed in a resin layer is corrected;

FIG. 27A is a graph which exemplifies a linear function as thecorrection function related to a fifth embodiment;

FIG. 27B is a graph which exemplifies a function which sets the amountof correction in steps as the correction function related to a fifthembodiment;

FIG. 27C is a graph which exemplifies a function which sets the amountof correction locally as the correction function related to a fifthembodiment;

FIG. 28A is a diagram which shows an example in which a correctionfunction changes for each region of the though hole electrode substraterelated to the fifth embodiment;

FIG. 28B is a diagram which shows another example in which a correctionfunction changes for each region of the though hole electrode substraterelated to the fifth embodiment;

FIG. 29 is a diagram which shows an example in which a plurality of chipshaped through-hole electrode substrates are formed within a waferrelated to the fifth embodiment;

FIG. 30 is a perspective view diagram which shows a formation example ofa daughter board which uses a though hole electrode substrate related tothe sixth embodiment; and

FIG. 31 is a perspective view diagram which shows a formation example ofa control board mounted with the daughter board in FIG. 30; and

FIG. 32 is a perspective view diagram which shows a formation example ofan electronic device mounted with the control board in FIG. 31.

DETAILED DESCRIPTION OF THE INVENTION

(First Embodiment)

The first embodiment of the present invention will be explained whilereferring to the drawings.

(Structure of the Through-Hole Electrode Substrate)

The structure of the through-hole electrode substrate 100 related to thefirst embodiment will be explained while referring to FIG. 1 and FIG. 2.FIG. 1 is a planar view diagram of the through-hole electrode substrate100 see form the upper surface. FIG. 2 is a cross sectional diagram seefrom the line A-A in FIG. 1. In FIG. 1 and FIG. 2, the same structuralcomponents as in the through-hole electrode substrate 10 in FIG. 22 areattached with the same reference symbols. In the through-hole electrodesubstrate 100 shown in FIG. 1 and FIG. 2, a resin layer 101 and a land15 are formed on the upper and lower surfaces of a silicon substrate 11(base material) which is formed with an insulation film 13 and athrough-hole electrode 14. The resin layer 101 may be formed using aninorganic insulation film such as a silicon oxide film or a siliconnitride film. In addition, the resin layer 101 is preferred to be aninsulation film having a gas discharge function using a resin materialsuch as polyimide. In this case, the resin layer 101 is arranged fordischarging gas which is discharged from within the through-holeelectrode 14 to the exterior. That is, in the first embodiment, theresin layer 101 may be arranged as a gas discharge part. Furthermore,the resin layer 101 causes peeling (raised parts) of a pad in the land15 together with stretching of a metal material such as copper (Cu) etcwhich is filled as the through-hole electrode 14 in an anneal processbut is also arranged to demonstrate damper effects by functioning as abuffer layer for relieving stretching of the metal material.Furthermore, the thickness of the silicon substrate 11 is notparticularly limited and can be appropriately set according to purpose.

(Manufacturing Method of the Through-Hole Electrode Substrate)

Next, a process for manufacturing the through-hole electrode substrate100 is explained while referring to FIG. 3 and FIG. 4. FIG. 3A to FIG.3E are diagrams which shows the sequence of processes for forming athrough-hole electrode on the silicon substrate 11. Furthermore, in FIG.3A to FIG. 3E, only one though hole electrode 14 is shown formed on thesilicon substrate 11 in order to simplify the explanation. In an actualsilicon substrate 11, a plurality of through-hole electrodes having adesired hole diameter (for example, 10 [μm] to 100 [μm]) are formed atdesired intervals depending on the specifications.

(1) Forming a Through-Hole First, in FIG. 3A, a hole (not shown in thediagram) which does not pass completely through the substrate is formedon one surface of the silicon substrate 11 using a method such as RIE,DeepRIE, light etching or wet etching. Next, the silicon substrate 11 isthinned by a method such as grinding from the other surface of thesilicon substrate 11, that is, the surface opposite to the surface onwhich the hole is formed and the hole passes completely through thesubstrate forming the through-hole 12.(2) Forming an Insulation Film

Next, in FIG. 3B, an insulation film 13 is formed on the upper surfaceand lower surface of the silicon substrate 11 and the interior wall ofthe though hole 12. The insulation film 13 is comprised for example fromsilicon oxide (SiO₂), silicon nitride (SiN) or silicon carbon (SiC).This insulation film 13 is formed using an LPCVD method, plasma CVDmethod or sputter method. In the case the insulation film 13 is formedfrom silicon oxide (SiO₂), it is also possible to form using a thermaloxidation method or anode oxidation method. The insulation film 13 maybe formed as a single layer or as a multi-layer structure having two ormore layers.

(3) Forming a Seed Layer

Next, in FIG. 3C, a seed layer 121 is formed on the lower surface sideof the silicon substrate 11 formed with the insulation film 13 using amethod such as a sputtering method. Furthermore, the seed layer 121 maybe formed in one layer using a material such as titanium (Ti) or may beformed in two layers using titanium (Ti) and copper (Cu). In the casewhere the seed layer 121 is formed in two layers, it is preferred thatthe copper (Cu) layer be formed as a layer which contacts with thethrough-hole electrode 14 described below.

(4) Forming a Conducting Part

Next, in FIG. 3D, the seed layer 121 of the silicon substrate 11 is madeinto a power supply layer by electrolytic plating and a conducting part22 is formed by filling a conducting material (copper (Cu), or copperalloy etc) into the through-hole 12. In this case, the conducting part122 is also formed on the surface on which the seed layer 121 is formedas is shown in FIG. 3D. It is possible to use a sputtering method, anon-electrolytic plating method, a molten metal aspiration method, aprinting method or CVD method for filling the copper (Cu) or copperalloy.

(5) Forming a Through-Hole Electrode Next, in FIG. 3E, the surface onwhich the seed layer 121 and the conduction part 122 of the siliconsubstrate 11 is formed is etched using a method such as CMP, theconduction part 122 and the seed layer 121 are removed and the formationof the through-hole electrode 14 is complete.(6) Forming a Resin Layer

Next, in FIG. 4A, on the upper and lower surfaces of the siliconsubstrate 11 formed with the through-hole electrode 14, an insulationresin such as photosensitive polyimide is patterned on the periphery ofthe through-hole electrode 14 as is shown in FIG. 1 and FIG. 2 usingphotolithography, annealing (200° C. to 400° C.) and a resin layer 101is formed. In this case, it is important that the resin layer 101 isformed so as to cover one part of a boundary section between a formationpart of the insulation film 13 and a formation part of the through-holeelectrode 14. That is, in the annealing process described above, it isclear that the gas which is discharged from the interior of thethrough-hole electrode 14 is discharged from a slight gap formed on theboundary part between the insulation film 13 and the through-holeelectrode 14 after removing a plating resist 124 described later by achemical process using an organic solvent. This will be describedfurther below. Furthermore, the resin layer 101 may be formed using aninorganic material (SiO₂, SiN etc) or an organic material with anorganic material being preferred. As an organic material, for example, amaterial including one or two or more of materials selected from thefollowing can be used as the resin layer 101: epoxy resin, polyimideresin, benzocyclobutane resin, polyamide resin, phenol resin, siliconresin, fluorine resin, crystalline polymer, polyamide-imide,polybenzooxazole, cyanate resin, aramid, polyolefin, polyester, BTresin, polyacetal, polybutylene terephthalate, syndiotactic polystyrene,polyphenylene sulfide, polyether ether ketone, polyether nitrile,polycarbonate, polyphenylene ether polysulfone, polyether sulfone,polyarylate, polyetherimide. In addition, an inorganic filler such asglass, talc, mica, silica or alumina may be used in combination in theresin layer 101. As long as the resin layer 101 includes a materialwhich has a gas discharge function and a buffer layer function anymaterial may be used.

(7) Forming a Plating Resist

Next, in FIG. 4B, a seed layer 123 is formed on the surface which isformed with the resin layer 101 using a sputtering method. A platingresist is formed on the seed layer 123 using photolithography.Furthermore, the seed layer 123 may be formed as one layer usingtitanium Ti as a seed material or as two layers using titanium (Ti) andCU (copper).

(8) Forming a Land

Next, in FIG. 4C, a land 15 which becomes wiring and an electrode pad isformed by making the seed layer 123 as a power supply layer byelectrolytic plating. The land 15 may be formed using copper (Cu), gold(Au), multi-layer plating (Cu/Ni/Au) or a copper alloy as a material.Next, on the surface on which the land 15 of the silicon substrate 11 isformed, the plating resist 124 is removed by a chemical process, theseed layer 123 is removed by a chemical etching process and formation ofthe through-hole electrode substrate 100 is complete.

In FIG. 3 and FIG. 4, the case where the resin layer 101 and the land 15are formed on the upper and lower surfaces of the silicon substrate 11is shown. However, the resin layer 101 and the land 15 may be similarlyformed on only the upper surface or only the lower surface of thesilicon substrate 11 by the above described process.

(Tilt and Gas Discharge of the Through-Hole Electrode During Etching)

In the through-hole electrode substrate 100 formed by the manufacturingmethod described above, in the case where the through-hole 12 is formedusing dry etching, it was confirmed that a tilt occurs in which thethrough-hole 12 is formed gradually leaning towards the upper surface ofthe silicon substrate 11 from the center part of the silicon substrate11 heading towards the exterior periphery as is shown in FIG. 5. In FIG.5, Each SEM photograph of a region A shown in the center part of thesilicon substrate 11 and a region B shown in the exterior periphery ofthe silicon substrate 11 are shown in FIG. 6A and FIG. 6B. Because atilt does not occur in the region A shown in FIG. 6A the positionalrelationship between the through-hole 12 and the rand 15 is normal, andpad peeling (raised parts) etch does not occur on the land 15. Inaddition, because a tilt occurs in the through-hole 12 in region B shownin FIG. 6B, a misalignment occurs in the positional relationship betweenthe through-hole 12 and the land 15, and pad peeling occurs in the land15. Furthermore, the insulation layer 13 is omitted in FIG. 5.

It was confirmed that the tilt of the through-hole 12 shown in FIG. 6Bbecomes pronounced heading towards to the exterior periphery of thesilicon substrate 11. Pad peeling is caused by the difference instretching directions of a conduction material (copper (Cu) or a copperalloy) in the conduction part 122 after annealing between thethrough-hole 12 (region A) at the center part where tilt does not occurand the through-hole 12 (region B) where tilt occurs. That is, thethermal expansion coefficient of copper (Cu) in the case of using copper(Cu) as a conductive material is 17.5 [PPM] and the thermal expansioncoefficient of silicon (Si) of the silicon substrate 11 is 4 [PPM].Transformations are produced in the through-hole 12 during an annealprocess due to the difference in these thermal expansion coefficients.Because tilt does not occur in the through-hole electrode 14 formed atthe center of the silicon substrate 11, stretching of copper (Cu) occursin only one direction during the anneal process, returns to its originalstate after the anneal process and there is not effect on the pad of theland 15. However, because tilt occurs in the through-hole electrode 14which his formed on the exterior periphery of the silicon substrate 11,the stretching direction of the copper (Cu) during an anneal processbecomes complex, the copper does not return to its original state afterthe anneal process and pad peeling etc occurs in the pad of the land 15.

In addition, it was confirmed that any remaining gas (water (H₂O) orhydrogen (H₂) etc) in the metal material such as copper (Cu) filled asthe through-hole electrode 14 described above, and the silicon substrate11 was discharged during the annealing process. In the case where aheating temperature is raised to 300° C., 400° C., the discharged amountof water (H₂O) and hydrogen (H₂) increases. The reason for the increasein the amount of discharged water (H₂O) and hydrogen (H₂) is that afterthe plating resist 124 is removed by a chemical process and the seedlayer 123 is removed by etching, a slight gap is formed at the boundarysection between the insulation film 13 and the through-hole electrode14. It was confirmed that when the gas (water (H₂O) and hydrogen (H₂)etc) which is discharged from the interior of the through-hole electrodebuilds up in the gap which is produced at this boundary section, theland 15 is pushed up, and defects such as blow off are produced.

Furthermore, in the through-hole electrode substrate 100 of the presentembodiment, a resin layer 101 is formed on the upper surface and lowersurface of the silicon substrate 11 and given a buffer layer functionfor buffering a transformation in the through-hole electrode 14. Inaddition, the resin layer 101 may also be given a gas discharge functionwhich discharges the gas which is discharged from the through-holeelectrode 14 to the exterior. However, when tilt occurs in thethrough-hole electrode 14 stated above, a misalignment occurs betweenthe formation position of the through-hole electrode 14 and the positionof an opening 101 a which is formed on the resin layer 101, and [stepout] or [disconnection] occur as exemplified in FIG. 7 and FIG. 8. [stepout] means a misaligned so that a part of the position of the opening101 a formed on the resin layer 101 and the open position of thethrough-hole electrode 12 overlap. [disconnection] means a part of theposition of the opening 101 a formed on the resin layer 101 and the openposition of the through-hole electrode 12 do not match.

FIG. 7 is a cross sectional diagram of the through-hole electrode 100formed with the resin layer 101, and shows the state where tilt occursin the through-hole electrode 14 formed the periphery part among aplurality of through-hole electrodes 14. A view of the region A andregion B in the diagram seen from the lower surface side is shown inFIG. 8A and FIG. 8B. The region A shown in FIG. 8A shows that [step out]occurs at the opening 101 a of the resin layer 101 with respect to thelower surface of the through-hole electrode 14 in which tilt occurs. Theregion B shown in FIG. 8B shows that [disconnection] occur at theopening 101 a of the resin layer 101 with respect to the lower surfaceof the through-hole electrode 14 in which tilt occurs. Furthermore, when[step out] occurs, because a part of the contact between the lowersurface of the through-hole electrode 14 and an electrode pad of theland 15 is misaligned there is a possibility of conduction defects. Inaddition, when [disconnection] occur, there is no contact between thelower surface of the through-hole electrode 14 and the electrode pad ofthe land 15 which causes conduction defects.

When it is judged that [step out] or [disconnection] shown in FIG. 8Aand FIG. 8B have occurred, because there is a possibility of conductiondefects being generated between the through-hole electrode 14 andelectrode pad of the land 15, it is considered defective. As a result,for example, twenty four chips worth of through-hole electrodesubstrates 100 are formed within the wafer 300 shown in FIG. 9 and tiltdoes not occur in the through-hole electrodes 14 in the four chipsformed in the center of the wafer 300 and [step out] and [disconnection]do not occur in the opening 101 a of the resin layer 101 with respect tothe formation position of the through-hole electrode 14. Consequently,these four chips are considered non-defective products. In addition, asis shown in FIG. 9, because tilt occurs in the through-holes electrodes14 in the twenty chips which are formed on the periphery of the fourchips formed at the center of the wafer 300, [step out] occurs at theopening 101 a of the resin layer 101 with respect to the formationposition of the through-hole electrode 14. Therefore, these twenty chipsare considered defective products.

Therefore, among the plurality of chip shaped through-hole electrodesubstrates 100 formed in the surface of the wafer 300 shown in FIG. 9,only the four chips formed at the center of the wafer are cut out asnon-defective products and the other twenty chips become defectiveproducts which lowers yield. Furthermore, the size of the wafer 300shown in FIG. 9 is 6 inches for example and the chip formation regionextends inwards about 15 [mm] from the exterior periphery of the wafer300. In addition, in this case, each chip size is about 18 [mm]×18 [mm].Also, it was confirmed that tilt of the through-hole electrodes 14 shownin FIG. 8 and FIG. 9 occurs even if the size of the wafer 300 isincreased to 8 inches.

(Correction of an Open Position of a Resin Layer Together with Tilt)

In order to manage misalignment of the formation position of the opening101 a of the resin layer together with the tilt of the though hole 12, aprocess for correcting the position in which the opening 101 a of theresin layer 101 is formed while considering tilt of the through-hole 12is explained while referring to FIG. 10 and FIG. 11.

FIG. 10 is a diagram which shows a cross section of a through-holeelectrode substrate 100 in which a position of an opening 101 a of aresin layer 101 has been corrected with respect to a through-holeelectrode 14 formed with tilted through-hole 12. FIG. 11A is a diagramwhich shows a conventional mask A in which a position of an openingformed on the resin layer 101 has not been corrected, and FIG. 11B is adiagram which shows a proposed mask B in which a position of an openingformed on the resin layer 101 has been corrected.

In FIG. 10, the coordinates at the center of the through-hole electrodesubstrate are set at (0, 0), a design distance is set as design value d,and a distance up to the actual formation position is set as distance ras a distance from the center of this substrate to the center part ofthe opening 101 a of the resin layer 101. In the present embodiment, therelationship between the design value d and distance r of each openposition is measured in advance. For example, the through-hole electrodesubstrate 100 is manufactured by the above described manufacturingmethod and the distance r from the center of the substrate to the centerof each open position is measured. A correction function a=r/d whichdetermines the amount of correction of each open position formed in theresin layer 101 is measured in advance based on the difference betweenthe measured distance r and the design value d.

In FIG. 11, the position (shown by the coordinates (x, y)) of eachopening 101 a formed in the resin layer 101 is not corrected by theconventional mask A shown in FIG. 11A. As a result, in the case wherethe opening 101 a is formed in the resin layer 101 using this mask A,there is a possibility that [step out] or [disconnection] in the opening101 a shown in FIG. 8 and FIG. 9 will occur. Alternatively, the position(shown by the corrected coordinates (X, Y)) of each opening 101 a formedin the resin layer 101 is corrected based on the above describedcorrection function a by the proposed mask B shown in FIG. 11B. In thiscase, the correction coordinates (X, Y) are corrected as X=ax, Y=ay bymultiplying the correction function a by the original coordinates (x,y). The results of forming the opening 101 a in the resin layer 101using this mask B are shown in FIG. 12 and FIG. 13. Furthermore, thecorrection function is not limited to the linear function shown. Forexample, the formation position of the opening 101 a made be correctedby measuring the spread/width of the tilted through-hole 12 and thedistribution of the dimensions, expressing this distribution as aquadratic curve, measuring a quadratic function from the quadratic curveand using this quadratic function to correct the formation position ofthe opening 101 a. For example, the correction function a=r/d² whichdetermines the correction amount of the position of each opening ismeasured, coordinates (x, y) which show the position of each opening 101a are multiplied using this correction function and the coordinates (x,y) may be corrected as X=ax², Y=ay². In this way, by correcting theformation position of the opening 101 a using a correction function, thecenter position of the corrected opening 101 a moves away with respectto the center position of the tilted through-hole 12.

FIG. 12 is a diagram which shows a cross section of the through-holeelectrode substrate 100 manufactured using the mask B shown in FIG. 11Bin the manufacturing process described above. Each SEM photograph of theregion A shown in the center of this through-hole electrode substrateand the region B shown in the periphery part are shown in FIG. 13. FIG.13A is a SEM photograph of the region A. Because tilt does not occur inthe through-hole electrode 14 formed in the center of the through-holeelectrode substrate 100, [step out] or [disconnection] does not occur inthe opening 101 a formed in the resin layer 101, and pad peeling alsodoes not occur. FIG. 13B is a SEM photograph of the region B. Tiltoccurs in the through-hole electrode 14 formed in the periphery part ofthe through-hole electrode substrate 100. However, the position of theopening 101 a formed in the resin layer 101 is corrected to a positioncorresponding to the tilt by the mask B. As a result, [step out] or[disconnection] do not occur in the opening 101 a formed in the resinlayer 101 and pad peeling also does not occur.

(Gas Discharge Effects Via the Resin Layer)

The through-hole electrode substrate 100 related to the present firstembodiment is formed with the resin layer 101 so as to cover a boundarypart between the insulation film 13 which is exposed on the surface ofthe silicon substrate 11 and one part of the through-hole electrode 14.In addition, because the resin layer 101 has a larger molecularstructure than the gas (water (H₂O) or hydrogen (H₂)) moleculesdischarged from the interior of the through-hole electrode 14, it ispossible to discharge this gas to the exterior. That is, as is shown inFIG. 14, in an anneal process, the gas (water (H₂O) or hydrogen (H₂))discharged from the interior of the through-hole electrode 14 isdischarged to the exterior via the resin layer 101. Furthermore, thearea of the resin layer 101 in contact with the through-hole electrode14 which is exposed on the surface of the silicon substrate 11 may be20% to 80% for example with respect to the entire exposed area of thethrough-hole electrode 14. In addition, the thickness of the resin layer101 may be 1 [μm] to 20 [μm] and more preferably 3 [μm] to 8 [μm]. Eachvalue of the contact area and thickness of the resin layer 101 is notparticularly limited and may be any value sufficient for demonstratingthe above described gas discharge effects.

As a result, it is possible to prevent the occurrence of phenomena suchas pad peeling described above. In this way, in the case where a resinlayer 101 is added to the through-hole electrode substrate 100, inaddition the effects of discharging gas to the exterior from theinterior of the through-hole electrode 14 it was determined that theinvention has the effects of reduce stretching of copper (Cu) etc filledas the through-hole electrode 14, and preventing the occurrence ofdefects (buffer effects) such as raising of the land 15 or blow off.

As stated above, in the through-hole electrode substrate 100 shown inthe first embodiment, it is possible to discharge the gas dischargedfrom the interior of the through-hole electrode 14 formed by filling ametal material (copper (Cu) etc) into the through-hole 12 which isformed in the silicon substrate 11 by a newly arranged resin layer 101.In addition, it was clear that this resin layer 101 has the effects(buffer effects) of reducing stretching of the filled copper (Cu) etc.As a result, it is possible to prevent the occurrence of phenomena suchas pad peeling.

In addition, in the through-hole electrode substrate 100 shown in thefirst embodiment, when forming the through-hole 12 the position of theopening 101 a formed in the resin layer 101 is corrected with respect tothe occurrence of a tilt in the through-hole 12 which gradually leansfrom the center of the silicon substrate 11 towards the periphery part.As a result, it is possible to prevent [step out] or [disconnection] ofan electrode pad which conducts with the through-hole electrode 14. As aresult, when forming a plurality of chip shaped through-hole electrodesubstrates 100 in a wafer, it is possible to reduce defective chips dueto [step out] or [disconnection] of an electrode pad and it is possibleto improve yield. A plurality of chip shaped through-hole electrodesubstrates 100 in which the position of the opening 101 a formed in theresin layer 101 is corrected is shown formed in a wafer in FIG. 15. FIG.15 shows the case where twenty four chips worth of through-holeelectrode substrates 100 are formed on a six inch wafer 300 as is shownin FIG. 9. In this case, as a result of performing a process forcorrecting the open position described above [step out] or[disconnection] does not occur in the opening 101 a of the resin layer101 with respect to a tilt in any of the through-hole electrodes 14 ineach chip on the periphery of the wafer 300. Therefore, all of thetwenty four chips worth of through-hole electrode substrates 100 arenon-defective products.

(Second Embodiment)

The second embodiment of the present invention will be explained indetail below while referring to the drawings.

(Structure of a Through-Hole Electrode Substrate)

The structure of a through-hole electrode substrate 200 related to thesecond embodiment is explained while referring to FIG. 16 and FIG. 17.FIG. 16 is a planar view diagram of the through-hole electrode substrate200 seen from an upper surface. FIG. 17 is a cross sectional diagram seefrom the line B-B in FIG. 10. The same structural components as in thethrough-hole electrode substrate 100 shown in FIG. 1 and FIG. 2 areattached with the same reference symbols. In the through-hole electrodesubstrate 200 shown in FIG. 16 and FIG. 17, a resin layer 201 is formedon an upper and lower surface of a silicon substrate 11 and the interiorwall of a through-hole 12. The resin layer 201 may be formed using aninorganic insulation film such as a silicon oxide film or a siliconnitride film. In addition, the resin layer 201 is preferred to be aninsulation film having a gas discharge function using a resin materialsuch as polyimide. In this case, the resin layer 201 is arranged fordischarging gas which is discharged from within the through-holeelectrode 14 to the exterior. That is, in the second embodiment, theresin layer 201 may be arranged as a gas discharge part. Furthermore,the resin layer 201 causes peeling (raised parts) of a pad in the land15 together with stretching of a metal material such as copper (Cu) etcwhich is filled as the through-hole electrode 14 in an anneal processbut is also arranged for demonstrating buffer effects by functioning asa buffer layer for relieving stretching of the metal material.

(Manufacturing Method of the Through-Hole Electrode Substrate)

Next, a process for manufacturing the through-hole electrode substrate200 is explained while referring to FIG. 18 and FIG. 19. FIG. 18A toFIG. 18E are diagrams which shows the sequence of processes for forminga through-hole electrode on the silicon substrate 11. Furthermore, inFIG. 18A to FIG. 18E, only one though hole electrode 14 is shown formedon the silicon substrate 11 in order to simplify the explanation. In anactual silicon substrate 11, a plurality of through-hole electrodeshaving a desired hole diameter (for example, 10 [μm] to 100 [μm]) areformed at desired intervals depending on the specifications.

(1) Forming a Through-Hole First, in FIG. 18A, the silicon substrate 11is etched and a hole (not shown in the diagram) which does not passcompletely through the substrate is formed on one surface of the siliconsubstrate 11 using a method such as RIE, DeepRIE, light etching or wetetching. Next, the silicon substrate 11 is thinned by a method such asgrinding from the other surface of the silicon substrate 11, that is,the surface opposite to the surface on which the hole is formed and thehole passes completely through the substrate forming the through-hole12.(6) Forming a Resin Layer

Next, in FIG. 18B, a resin layer 201 is formed as an insulation layer (afirst insulation layer, a second insulation layer, and a thirdinsulation layer) on the upper and lower surfaces of the siliconsubstrate 11 and the interior wall of the through-hole 12. This resinlayer 201 is formed by a spray coat method. It is possible to use amaterial shown in the first embodiment described above as the resinlayer 201.

In addition, it is known that scallops (a rough waveline shape) areproduced on the interior wall of the through-hole 12 in the case wherethe through-hole 12 described above is formed by DeepRIE. In the presentsecond embodiment, by forming the resin layer 201 on the interior wallof the through-hole 12 it is possible to cover the scallops without gapsand planarize the interior wall of the through-hole 12.

(3) Forming a Seed Layer

Next, in FIG. 18C, a seed layer 121 is formed on the lower surface sideof the silicon substrate 11 formed with the resin layer 201 using amethod such as a sputtering method. Furthermore, the seed layer 121 maybe formed in one layer using a material such as titanium (Ti) or may beformed in two layers using titanium (Ti) and copper (Cu). In the casewhere the seed layer 121 is formed in two layers, it is preferred thatthe copper (Cu) layer be formed as a layer which contacts with thethrough-hole electrode 14 described below.

(4) Forming a Conducting Part

Next, in FIG. 18D, the seed layer 121 of the silicon substrate 11 ismade into a power supply layer by electrolytic plating and a conductingpart 122 is formed by filling a conducting material (copper (Cu), orcopper alloy etc) into the through-hole 12. In this case, the conductingpart 122 is also formed on the surface on which the seed layer 121 isformed as is shown in FIG. 27D. It is possible to use a sputter method,a non-electrolytic plating method, a molten metal aspiration method, aprinting method or CVD method etc for filling the copper (Cu) or copperalloy.

(5) Forming a Through-Hole Electrode

Next, in FIG. 18E, the surface on which the seed layer 121 and theconduction part 122 of the silicon substrate 11 is formed is etchedusing a method such as CMP, the conduction part 122 and the seed layer121 are removed and the formation of the through-hole electrode 14 iscomplete.

(6) Forming a Plating Resist

Next, in FIG. 19A, a seed layer 202 is formed on the surface which isformed with the resin layer 201 using a sputtering method. Next, in FIG.19B, a plating resist is formed on the seed layer 202 usingphotolithography. Furthermore, the seed layer 202 may be formed as onelayer using titanium Ti as a seed material or as two layers usingtitanium (Ti) and CU (copper).

(7) Forming a Land

Next, in FIG. 19C, a land 15 which becomes wiring and an electrode padis formed by making the seed layer 202 as a power supply layer byelectrolytic plating. The land 15 may be formed using copper (Cu), gold(Au), multi-layer plating (Cu/Ni/Au) or a copper alloy as a material.Next, on the surface on which the land 15 of the silicon substrate 11 isformed, the plating resist 203 is removed by a chemical process, theseed layer 202 is removed by a chemical etching process and formation ofthe through-hole electrode substrate 200 is complete.

In FIG. 18 and FIG. 19, the case where the resin layer 201 and the land15 are formed on the upper and lower surfaces of the silicon substrate11 is shown. However, the resin layer 201 and the land 15 may besimilarly formed on only the upper surface or only the lower surface ofthe silicon substrate 11 by the above described process.

(Gas Discharge Effects Via the Resin Layer)

In the through-hole electrode substrate 200 related to the presentsecond embodiment the resin layer 201 is formed on an interior wall onan upper and lower surface of the silicon substrate 11 and the interiorwall of the through-hole 12. In addition, because the resin layer 201has a larger molecular structure than the gas (water (H₂O) or hydrogen(H₂)) molecules discharged from the interior of the through-holeelectrode 14, it is possible to discharge this gas to the exterior. Thatis, as is shown in FIG. 20, in an anneal process, the gas (water (H₂O)or hydrogen (H₂)) discharged from the interior of the through-holeelectrode 14 is discharged to the exterior via the resin layer 201. As aresult, it is possible to prevent the occurrence of electrode padpeeling as described above.

In this way, in the through-hole electrode substrate 200 describedabove, in the case where the resin layer 201 is formed on the upper andlower surfaces of the silicon substrate 11, in addition to the effect ofdischarging a gas discharged from the interior of the through-holeelectrode 14 to the exterior it is clear that the present invention hasthe effects of reducing stretching of copper (Cu) which is filled as thethrough-hole electrode 14 in a vertical direction (perpendiculardirection to the upper and lower surfaces of the silicon substrate 11),and also the effect (buffer effect) of preventing the occurrence ofdefects such as raising of the land 15 and blow off. In addition,because the resin layer 201 is also formed on the interior wall of thethrough-hole 12, it is clear that the present invention has the effectof a widening of the copper (Cu) etc which is filled as the through-holeelectrode 14 in a horizontal direction (a direction parallel to theupper and lower surface of the silicon substrate 11) and also the effectof preventing the occurrence of cracks within the through-hole electrode14.

(Correction of a Land Position Together with Tilt)

The tilt of the through-hole electrode 14 as described in the firstembodiment similarly occurs in the through-hole electrode substrate 200related to the present second embodiment. As a result, as described inthe first embodiment, in the through-hole electrode substrate 200 theposition of the lower surface side land is corrected based on acorrection function a. Alternatively, the size of the land is widened toa level which does not cause [step out] or [disconnection]. In addition,for example, an insulation film may be formed on the upper surface andlower surface of the through-hole electrode substrate 200 and amulti-layer structure electrode pad may be formed on each insulationlayer. In this case, the electrode pad group related to the tilt is notdirectly connected with other circuit boards or electrical componentsand does not become a direct cause of connection defects. As a result,it is possible to prevent the occurrence of [step out] or[disconnection] in electrode pads which conduct with the through-holeelectrode 14. As a result, it is becomes possible to reduce theoccurrence of defective chips due to [step out] or [disconnection] ofthe electrode pad and improve yield when forming a plurality of chipshape through-hole electrode substrates 200 in a wafer.

As described above, in the through-hole electrode substrate 200 relatedto the present second embodiment, it is possible to discharge gas whichis discharged from the interior of the through-hole electrode 14 formedby filling a metal material (copper (Cu) etc) into the through-hole 12formed in the silicon substrate 11, to the exterior via the resin layer201. In addition, it is clear that the resin layer 201 includes effects(buffer effects) for reducing stretching in a vertical direction andwidening in a vertical direction of the filled copper (Cu) etc. As aresult, it is possible to prevent an occurrence of peeling of anelectrode pad, improve yield when manufacturing a plurality of chipshaped through-hole electrode substrates 200 in a wafer and improvereliability.

Furthermore, in the through-hole electrode substrate 200 related to thesecond embodiment, the resin layer 201 is formed as an insulation layeron the upper and lower surfaces of the silicon substrate 11 and theinterior wall of the through-hole 12. As a result, when forming thethrough-hole 12 using a DeepRIE method, it is possible to planarize theinterior wall of the through-hole 12 by filling a scallop gap producedin the interior wall of the through-hole, and filling a conductivematerial (copper (Cu) or a copper alloy etc) into the through-hole 12using a plating method etc can be performed better.

Furthermore, in the through-hole electrode 100 and 200 related to thefirst and second embodiments, a single layer structure formed with athrough-hole electrode 14, resin layers 101, 201 and a land 15 on thesilicon substrate 11 is shown. In the single structure through-holeelectrode substrates 100, 200, [step out] or [disconnection] in anelectrode pad which conducts with the through-hole electrode 14, in thecase where the through-hole electrode substrates 100, 200 are used as aninterposer, because the electrode pad is directly connected with othercircuit boards or electrical components, it becomes a direct cause forproducing connection defects which is not acceptable.

(Third Embodiment)

In the third embodiment an example of an electronic circuit board whichuses the through-hole electrode substrate 100, 200 shown in the firstand second embodiments as an interposer is explained.

FIG. 21 is a diagram which shows a structure of an electronic circuitboard 500 which uses the through-hole electrode substrates 100, 200shown in the first and second embodiments as an interposer 503 b. InFIG. 21, the electronic circuit board 500 is arranged with a printedcircuit board 501, and a chip board 503 comprised of a lower layer board503 a, an interposer 503 b and an upper layer board 503 c. A pluralityof solder balls 502 are formed on the upper surface of the printedcircuit board 501, and the printed circuit board 501 and the chip board503 are electrically connected via the plurality of solder balls 502. Aplurality of solder balls 504 are formed in the upper surface of thechip board 503, and the chip board 503 and an IC chip 505 areelectrically connected via the plurality of solder balls 504.

Lower layer wiring 503 d is formed on the lower layer board 503 a inorder to electrically connect the solder balls 502 and a through-holeelectrode 503 f of the interposer 503 b. The lower layer wiring 503 d isformed to match the formation position of the solder balls 502 and theformation position of the through-hole electrode 503 f of the interposer503 b. Upper layer wiring 503 e is formed on the upper layer board 503 cin order to electrically connect the solder balls 504 and a through-holeelectrode 503 f of the interposer 503 b. The upper layer wiring 503 e isformed to match the formation position of the through-hole electrode 503f of the interposer 503 b and the formation position of the solder balls504.

The interposer 503 b is electrically connected with a lower layer wiring503 d formed in the lower layer board 503 a via a plurality ofthrough-hole electrodes 503 f, and an upper layer wiring 503 e formed onthe upper layer board 503 c. As is shown in FIG. 21, it is possible tomount the IC chip 505 at high level of density via the chip board 503without changing the wiring pattern (not shown in the diagram) of theprinted circuit board 501 by applying the interposer 503 b to theinterior of the chip board 503.

As described above, by forming the electronic circuit board 500 usingthe through-hole electrode substrates 100, 200 as the interposer 503 bit is possible to mount the IC chip 505 at high level of density on theprinted circuit board 501. Therefore, it is possible to contribute tothe miniaturization of an electronic device by applying the electroniccircuit board 500 to an electronic device.

Furthermore, in the third embodiment, an example where the through-holeelectrode substrates 100, 200 are used as the interposer 503 b of theelectronic circuit board 500 is shown. However, the present invention isnot limited to this. For example, the example may also be applied tovarious electronic devices in which a high level of mounting density isdesired such as mobile phones, computers and IC tester probe cards etc.

(Fourth Embodiment)

In the fourth embodiment, the process for correcting the position of theopening 101 a formed on the resin layer 101 together with tilt of thethrough-hole 12 described above is explained while referring to FIG. 23,FIG. 24, FIG. 25 and FIG. 26. In the first embodiment described above,in the case where the tilt of through-hole 12 becomes larger as thedistance increases from the center part of the through-hole electrodesubstrate, the case where the formation position of the opening iscorrected using a correction function (linear function, or quadraticfunction) is shown. In the fourth embodiment, the case is explainedwhere the formation position of the opening is corrected in the casewhere tilt of the through-hole 12 is produced randomly regardless of theposition within the through-hole electrode substrate.

First, the case where tilt of the through-hole 12 is produced randomlyis explained while referring to FIG. 23 and FIG. 24. FIG. 23 is a crosssectional diagram of a through-hole electrode substrate 600 formed witha resin layer 101, and shows the state of a change in shape andproduction of tilt in a through-hole 12 formed on a periphery part amonga plurality of through-hole electrodes 14. A view of region A and regionB in the diagram seen from a lower surface side is shown in FIG. 24. Inthe region A shown in FIG. 24, the shape of the opening 101 a of theresin layer 101 is transformed to an elliptical shape and [step out] isproduced with respect to a lower surface of the through-hole electrode14 in which a transformation in shape and tilt of the through-hole 12 isproduced. In the region B shown in FIG. 24, the shape of the opening 101a of the resin layer 101 is transformed to an indeterminate shape and[step out] is produced with respect to a lower surface of thethrough-hole electrode 14 in which a transformation in shape and tilt ofthe through-hole 12 is produced. In this way, in the through-holeelectrode substrate 600, in the case where random tilt is produced inthe through-hole electrode 14 together with a transformation in shape ofthe through-hole 12, because there is a loss of contact of a partbetween the lower surface of the through-hole electrode 14 and theelectrode pad of the land 15 due to [step out] produced by varioustransformations in the shape of the opening 101 a of the resin layer101, there is a possibility of defects in conductivity.

(Correction of Open Position of Resin Layer Together with Tilt)

The amount of tilt of each through-hole 12 is measured and the positionin which the opening 101 a of the resin layer 101 is formed is correctedin order to manage a misalignment in the formation position of theopening 101 a of the resin layer 101 together with the random tilt ofthe through-hole 12 as is shown in FIG. 23 and FIG. 24. This process isexplained while referring to FIG. 25 and FIG. 26.

FIG. 25 is a diagram which shows a cross section of the through-holeelectrode substrate 100 in which the position of the opening 101 aformed in the resin layer 100 is corrected with respect to thethrough-hole electrode 14 formed in the tilted through-hole 12. FIG. 26Ashows a conventional mask A in which the position of the opening formedin the resin layer 101 is not corrected and FIG. 26B shows a proposedmask B in which the position of the opening formed in the resin layer101 is corrected.

In FIG. 25, the coordinates of the center part of the through-holeelectrode substrate 100 are set at (0, 0), and a design distance is setas design value d and a distance up to the actual formation position isset as distance r as a distance from the center of this substrate to thecenter part of the opening 101 a of the resin layer 101. FIG. 25 andFIG. 26, the coordinates corresponding to the design value of each openposition are set at (xd, yd), and the coordinates corresponding to eachopen position after correction are set to (Xr, Xr). In this case, thecoordinates (xd, yd) corresponding to the design value d are correctedbased on the difference between the design value d and the distance rand the coordinates (Xr, Xr) in which correcting the position of eachopen formed in the resin layer 101 are measured.

As described above, the coordinates (Xr, Xr) for correcting the positionof each opening formed in the resin layer 101 are measured based on thedifference between the design value d and the distance r, and by formingthe opening 101 a in the resin layer 101 using these coordinates (Xr,Xr), it is possible to obtain the mask B after correction shown in FIG.26B. Therefore, even in the case where the through-hole 12 is randomlytitled, it is possible to appropriately correct the formation positionof each opening 101 a formed in the resin layer 101 by measuring thecoordinates (Xr, Xr) for correcting the position of each opening formedin the resin layer 101 based on the difference between the design valued of the position of each opening and the distance r to the actualformation position of each opening. As a result, it is possible toreduce the production of defects chips caused by [step out] or[disconnection] in an electrode pad and improve yield when forming aplurality of chip shaped through-hole electrode substrates 200 in awafer.

(Fifth Embodiment)

In the fifth embodiment, a correction function for correcting theformation position of the opening described above is explained. In thefirst embodiment described above, an example of a linear function and aquadratic function was explained, however, in the fifth embodiment, anexample of various correction functions is explained while referring toFIG. 27 and FIG. 28.

FIG. 27A is a graph which exemplifies a linear function as a correctionfunction. In FIG. 27A, the vertical axis shows the amount of correctionand the horizontal axis shows the range from the center to the peripheryof the through-hole electrode substrate as a formation position of anopening. In this case, the amount of correction of a formation positionof an opening increases continuously heading to the periphery from thecenter of the through-hole electrode substrate. In the case ofcorrecting the formation position of each opening using this correctionfunction, the formation position of each opening formed in a resin layerwidens gradually in the periphery direction heading from the center tothe periphery of the through-hole electrode substrate. That is, theformation position is corrected as is shown in FIG. 10B.

FIG. 27B is a graph which exemplifies a function which sets the amountof correction in steps as the correction function. In FIG. 27B, thevertical axis shows the amount of correction and the horizontal axisshows the range from the center to the periphery of the through-holeelectrode substrate as the formation position of an opening. In thiscase, the amount of correction of a formation position of an openingincreases is steps in every region, region A, region B, region C andregion D shown in the diagram, in the range from the center to theperiphery of the through-hole electrode substrate. In the case ofcorrecting the formation position of each opening using this correctionfunction, the formation position of each opening formed in a resin layerwidens in steps in the periphery direction in each region, region A,region B, region C and region D, in the range from the center to theperiphery of the through-hole electrode substrate.

FIG. 27C is a graph which exemplifies a function which sets the amountof correction locally as the correction function. In FIG. 27C, thevertical axis shows the amount of correction and the horizontal axis therange from the center to the periphery of the through-hole electrodesubstrate as the formation position of an aperture. In this case, theamount of correction of the formation position of the opening increaseslocally in the region B show in the diagram, in the range from thecenter to the periphery of the through-hole electrode substrate. In thecase of correcting the formation position of each opening using thiscorrection function, the formation position of each opening formed inthe resin layer widens locally in a periphery direction in the region B,in the range from the center to the periphery of the through-holeelectrode substrate.

As described above, the correction function shown in FIG. 27A, FIG. 27Band FIG. 27C may be applied as the correction function for correctingthe formation position of the opening described above. Therefore, bypreparing these correction functions in advance, it is possible tounderstand the state of the tilt produced in a through-hole andappropriately select a correction function for correcting the formationposition of an opening when manufacturing the through-hole electrodesubstrate.

FIG. 28A and FIG. 28B is a graph which exemplifies the case where thecorrection function is changed for each region of a through-holeelectrode substrate formed with an opening. In FIG. 28A, the verticalaxis shows the amount of correction and the horizontal axis shows therange from the center to the periphery of the through-hole electrodesubstrate as the formation position of the opening. In this case, theamount of correction of the formation position of the opening is set at[no correction] in region A, [fixed value correction] in region B,[linear correction] in region C, [quadratic curve correction] in regionD and [random correction] in region E shown in the diagram within therange from the center to the periphery of the through-hole electrodesubstrate. In a linear correction, the formation position of the openingis corrected by a correction amount based on the linear functiondescribed above. In the fixed value correction, the formation positionof the opening is corrected by a fixed correction amount. In thequadratic curve correction, the formation position of the opening iscorrected by a correction amount based on the quadratic functiondescribed above. In the random correction, the formation position of theopening is corrected by measuring the coordinates (Xr, Xr) forcorrecting the position of each opening formed in the resin layer basedon the difference between the design value d of the position of eachopening shown in FIG. 26 and the distance r to the actual formationposition.

In FIG. 28B the vertical axis shows the correction amount and thehorizontal axis shows the range from the center to the periphery of thethrough-hole electrode substrate as the formation position of theopening. In this case, the amount of correction of the formationposition of the opening is set at [no correction] in region A, [fixedvalue correction] in region B and region B′, [linear correction] inregion C and region C′, [quadratic curve correction] in region D andregion D′ and [random correction] in region E and region E′ shown in thediagram within the range from the center to the periphery of thethrough-hole electrode substrate with the center being between region B′and region C′ in the diagram. Furthermore, [fixed value correction]means correcting the formation position of each opening by a fixedcorrection amount regardless of the formation position of a through-holeelectrode substrate within the surface of a silicon substrate.

As described above, by changing the correction function for correctingthe formation position of an opening for each region as shown in FIG.28A and FIG. 28B it is possible to appropriately correct the formationposition of each opening formed in a resin layer for each region. As aresult, it is possible to reduce the production of defects such as [stepout] or [disconnection] in an electrode pad and improve yield whenforming a plurality of chip shaped through-hole electrode substrates 200in a wafer. For example, in dry etching used when manufacturing athrough-hole electrode substrate, in the case where the distribution ofion sheath is different in the surface of a silicon substrate, it isfeared that the amount of tilt may change in a through-hole in eachformation position of the through-hole electrode substrate formed in thesilicon substrate. In this case, for example, by applying [fixed valuecorrection] or [linear correction] described above to a region in whichtilt is small and applying [quadratic curve correction] or [randomcorrection] to a region in which tilt is large in the surface of asilicon substrate, it is possible to appropriately correct the formationposition of each opening formed in a resin layer in the surface of thesilicon substrate.

Furthermore, an example is shown in which a correction function ischanged for each region within one through-hole electrode substrate inthe fifth embodiment described above, however, the present invention isnot limited to this. For example, [no correction], [fixed valuecorrection], [linear correction] and [random correction] may be appliedto each formation region of this plurality of through-hole electrodesubstrates by understanding the tilt tendency produced in a through-holewithin the through-hole electrode substrate for each formation region ofa plurality of through-hole electrode substrates imposed to the surfacewithin the wafer. In this case, for example, it is possible to form morechip shaped through-hole electrode substrates 600 in the wafer 700 shownin FIG. 29 than the plurality of chip shaped through-hole electrodesubstrates 100 formed in the surface of the wafer 300 shown in FIG. 9,and cut out the 16 chips formed in the center part as good products. Asa result, it is possible to improve the yield of the through-holeelectrode substrate and reduce manufacturing cost.

(Sixth Embodiment)

An example of an electronic circuit board mounted with a sensor devicewhich uses the through-hole electrode substrates 100, 200, 600 shown inthe first, second and fourth embodiments as an interposer is explainedin the sixth embodiment.

FIG. 30 is a perspective view diagram which shows a structural exampleof a daughter board mounted with a sensor device. In FIG. 30, thedaughter board 700 is mounted on a sensor board 701 and is mounted witha sensor device 702 which is formed using the through-hole electrodesubstrates 100, 200, 600 shown in the first, second and fourthembodiments as an interposer. Furthermore, the sensor device 702 may beformed by a chip board 503 comprised for example from a lower layerboard 503 a, an interposer 503 b and an upper layer board 503 c as isshown in FIG. 21 in the third embodiment.

FIG. 31 is a perspective view diagram which shows a structural exampleof a control board 800 mounted with the daughter board 700 shown in FIG.30. In FIG. 31 the control board 800 is mounted on a motherboard 801 andis mounted with an IC chip 802 and daughter board 700.

As described above, by forming a sensor device 702 which is formed usingthe through-hole electrode substrates 100, 200 and 600 as an interposer,and forming a daughter board 700 mounted with this sensor device 702, itis possible to mount the IC chip 802 at high density on the motherboard801. Therefore, it is possible to contribute to the miniaturization ofan electrical device by applying this type of control board 800 to theelectrical device.

Here, a personal digital assistant 900 is shown in FIG. 32 as anelectrical device mounted with the control board 800. FIG. 32 is aperspective view diagram which shows a structural example of thepersonal digital assistant 900. In FIG. 32 the personal digitalassistant 900 is formed by a display part 901 and a keyboard part 902.The control board 800 is mounted within the keyboard part 902. Variousprograms are stored within the personal digital assistant 900 andincludes a function for executing communication processes and dataprocesses by each program. In this personal digital assistant 900, byusing dynamic quantity (for example, acceleration) which is detected bythe sensor device 702 on the control board 800 in an applicationprogram, it is possible, for example, to include a function which powerswitch off the terminal when a drop in acceleration is detected.

As described above, by mounting the control board 800 in a personaldigital assistant, it is possible to realize new functions and improvethe usefulness and reliability of the personal digital assistant.

What is claimed is:
 1. A method of manufacturing a through-holeelectrode substrate comprising: forming a plurality of through-holes ina substrate: forming a plurality of through-hole electrodes by filling aconductive material into the plurality of through-holes; forming a firstinsulation layer on one surface of the substrate; forming a plurality offirst openings which expose the plurality of through-hole electrodescorresponding to each of the plurality of through-hole electrodes, onthe first insulation layer; and correcting a position of the pluralityof first openings based on a difference between a measured distance ofan open position of a leaning through-hole among the plurality ofthrough-holes and a design distance value of the open position of theleaning through-hole among the plurality of through-holes with respectto a center position of the substrate.
 2. The method of manufacturing athrough-hole electrode substrate according to claim 1, furthercomprising: forming a second insulation layer on the other surface ofthe substrate; forming a plurality of second openings which expose theplurality of through-hole electrodes, on the second insulation later;and correcting a position of the plurality of second openings based on adifference between a measured distance of an open position of a leaningthrough-hole among the plurality of through-holes and a design distancevalue of the open position of the leaning through-hole among theplurality of through-holes with respect to a center position of thesubstrate.
 3. The method of manufacturing a through-hole electrodesubstrate according to claim 2, wherein a position of the plurality ofsecond openings is corrected using a correction function which expressesa difference between a measured distance of an open position of theleaning through-hole and a design distance value of the open position ofthe leaning through-hole among the plurality of through-holes withrespect to a center position of the substrate.
 4. The method ofmanufacturing a through-hole electrode substrate according to claim 1,further comprising: forming a third insulation layer in each interiorwall of the plurality of through-holes, and forming a conductivematerial on the third insulation layer.
 5. The method of manufacturing athrough-hole electrode substrate according to claim 1, wherein eitherone or all of the first insulation layer, the second insulation layerand the third insulation layer are formed using an insulation resin. 6.The method of manufacturing a through-hole electrode substrate accordingto claim 1, wherein a position of the plurality of first openings iscorrected using a correction function which expresses a differencebetween a measured distance of an open position of the leaningthrough-hole and a design distance value of the open position of theleaning through-hole among the plurality of through-holes with respectto a center position of the substrate.
 7. The method of manufacturing athrough-hole electrode substrate according to claim 6, wherein the onesurface or the other surface of the substrate is divided into aplurality of regions from a center position heading to a periphery, andthe correction function for correcting a position of the plurality offirst openings or a position of the plurality of second openings is madedifferent for each of the plurality of regions.
 8. The method ofmanufacturing a through-hole electrode substrate according to claim 6,wherein the correction function uses a fixed value correction, a linearcorrection, a quadratic curve correction or a random correction.